Sub-100 nm Channel Length Organic Field Effect Transistor Fabricated by Wafer-Scale Nanoimprint Lithography formatIsbn:Softcover - 9783944331492 Das dabei angewendete Berechnungsmodell nach

Das dabei angewendete Berechnungsmodell nach dem statischen Verfahren wurde von Klaus Dietze (Concare Consulting) und Armin Barutzki (Konzernrevisor Merck AG) entwickelt

der Aufgaben in den verschiedensten Bereichen übernimmt

planmässige Kommunikation von und über Patentwissen findet nur selten statt

this paper investigates in which areas brand equity has been created for the [¿]

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Sub-100 nm Channel Length Organic Field Effect Transistor Fabricated by Wafer-Scale Nanoimprint Lithography formatIsbn:Softcover - 9783944331492 Das dabei angewendete Berechnungsmodell nachThis thesis was performed between October 2010 and October 2013 at the Institute of Semiconductors and Microsystems (IHM) of the Technische Universitt Dresden (TU Dresden). The main task of this work was fabrication of short channel Organic Field Effect Transistors (OFET) using Nanoimprint Lithography (NIL). Both the UV based NIL and the thermal based NIL with wafer scale polymer templates were applied to define OFET channel with lengths down to sub